In-situ Optical Emission Spectroscopy (OES) combined with quantum chemical calculations was used as a powerful tool to find out the exited reactive species existing in plasma discharge during the process of lead sulfide chalcogenide materials deposition. Low temperature nonequilibrium RF (40.68 MHz) plasma at low pressure (0.1 Torr) was employed for initiation of chemical interaction between precursors in the gas phase. Only high-pure elements were utilized as the initial substances. The ration between starting materials in the gas phase and power included into the plasma discharge were the variables. The mechanism of the plasma-chemical reaction was assumed and discussed. The stoichiometry and morphology of the surface of the as-deposited materials were studied by different analytical techniques.

原位发射光谱（OES）与量子化学计算相结合被用作一种强大的工具，以发现硫化铅硫族化物材料沉积过程中等离子体放电中存在的已存在反应物种。低压（0.1 Torr）下的低温非平衡RF（40.68 MHz）等离子体用于引发气相中前体之间的化学相互作用。仅使用高纯元素作为初始物质。气相中的原料与等离子体放电中包含的功率之间的比例是变量。假定并讨论了等离子体化学反应的机理。通过不同的分析技术研究了沉积材料表面的化学计量和形态。