The nanoablation (cold laser-induced etching) of a diamond surface has been experimentally investigated at different ambient air pressures ranging from atmospheric to high vacuum (${10}^{-7}$ Torr). The exposure of a diamond monocrystal sample was performed by using the second harmonic ($\lambda =400$ nm) of a Ti-sapphire laser ($\tau =120$ fs). The pressure dependence of the surface etching rate was obtained and corroborates a model that regards nanoablation as a result of multiphoton photochemical oxidation of the diamond. The features of the diamond oxidation at various environmental pressures are discussed as well as the effect of a surface water layer on the etching rate of the diamond.

已经在从大气压力到高真空的不同环境气压下对金刚石表面的纳米烧蚀（冷激光诱导蚀刻）进行了实验研究（${10}^{--7}$ r）。钻石单晶样品的曝光是通过使用二次谐波（$\lambda =400$ 纳米蓝宝石激光器（nm$\tau =120$fs）。获得了表面蚀刻速率的压力依赖性，并证实了一个模型，该模型将纳米烧蚀视为金刚石的多光子光化学氧化的结果。讨论了在各种环境压力下金刚石氧化的特征，以及表面水层对金刚石蚀刻速率的影响。