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Hydroxyl radical scavenging factor measurement using a fluorescence excitation-emission matrix and parallel factor analysis in ultraviolet advanced oxidation processes.
Chemosphere ( IF 8.1 ) Pub Date : 2020-06-22 , DOI: 10.1016/j.chemosphere.2020.127396
Tae-Mun Hwang 1 , Sook-Hyun Nam 2 , Juwon Lee 1 , Jae-Wuk Koo 2 , Eunju Kim 2 , Minhwan Kwon 3
Affiliation  

The performance of the UV/H2O2 advanced oxidation process (AOP) is dependent on water quality parameters, including the UV absorbance coefficient at 254 nm and hydroxyl radical (•OH) water background demand (scavenging factor, s−1). The •OH scavenging factor represents the •OH scavenging rate of the background substances in the water matrix, and it is known to be one of the key parameters to predict the performance of the UV/H2O2 process. The •OH scavenging factor has been determined experimentally by using a probe compound such as pCBA and rhodamine B. The experimental method has been validated to accurately predict the micropollutants removal in the UV/H2O2 process, but there is a need for an easier and simple method of determining the OH scavenging factor. We evaluated the alternative method to analyze the •OH scavenging factor using fluorescence excitation-emission matrix and parallel factor analysis (F-EEM/PARAFAC). The correlation between •OH scavenging factor and the spectroscopic characteristics and structure of different organic matter types was evaluated. Organic matter was characterized using a fluorescence excitation-emission matrix, parallel factor analysis, and liquid chromatography-organic carbon detection. Second-order reaction rates of humic acid sodium salt, sodium alginate, Suwannee River humic acid and bovine serum albumin were calculated as 1.30 × 108 M−1 s−1, 1.39 × 108 M−1 s−1, 1.03 × 108 M−1 s−1, and 3.17 × 107 M−1 s−1, respectively. Results of PARAFAC analysis, the ratio of humic and fulvic fluorescence component 2 to terrestrial humic-like fluorescence component 1 (C2/C1), and •OH scavenging factor showed high linearity. A predictive model, which combines with the F-EEM/PARAFAC method, predicted the optimal UV and H2O2 dose to achieve target compound removal.



中文翻译:

在紫外线高级氧化过程中,使用荧光激发-发射矩阵测量羟基自由基清除因子,并进行平行因子分析。

UV / H 2 O 2高级氧化工艺(AOP)的性能取决于水质参数,包括254 nm处的UV吸光系数和羟基自由基(•OH)的水本底需求(清除因子s -1)。•OH清除因子代表水基质中背景物质的•OH清除速率,众所周知,它是预测UV / H 2 O 2工艺性能的关键参数之一。通过使用p CBA和罗丹明B等探针化合物,实验确定了•OH清除因子。已验证了该实验方法可准确预测UV / H 2中的微量污染物去除O 2工艺,但是需要一种更简单的方法来确定OH清除因子。我们评估了使用荧光激发-发射矩阵和并行因子分析(F-EEM / PARAFAC)分析•OH清除因子的替代方法。评估了•OH清除因子与不同有机物类型的光谱特征和结构之间的相关性。使用荧光激发-发射矩阵,并行因子分析和液相色谱-有机碳检测对有机物进行表征。腐殖酸钠,海藻酸钠,苏万尼河腐殖酸和牛血清白蛋白的二阶反应速率经计算为1.30×10 8  M -1  s -1,1.39×10 8 中号-1 小号-1,1.03×10 8 中号-1 小号-1和3.17×10 7 中号-1 小号-1,分别。PARAFAC分析的结果,腐殖质和黄腐荧光成分2与陆地腐殖质样荧光成分1(C2 / C1)的比率以及•OH清除因子均显示出高线性。结合F-EEM / PARAFAC方法的预测模型预测了实现目标化合物去除的最佳UV和H 2 O 2剂量。

更新日期:2020-07-06
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