The structure and magnetic property of as prepared and post-annealed thin films of CoTbNi ternary alloy have been investigated. (Co_0.85Tb_0.15)_1-xNi_x alloy thin films with x = (0.54, 0.63, 0.72, 0.81) were grown on Si-substrate by co-sputtering of Ni element and Co_0.85Tb_0.15 alloy using dc magnetron sputtering. These films have been crystallized in amorphous form, as confirmed by X-ray diffraction (XRD) measurement. The magnetization versus field measurements shows that these films exhibit room temperature ferromagnetism. The magnetic properties of these alloy films have a strong dependency on the Ni concentrations. It is observed that the saturation magnetization and coercivity of these alloy thin films decreases with increase of Ni content of the films. One of the striking features was the observation of perpendicular magnetic anisotropy (PMA) for x = 0.63 and 0.72 thin films. However, the observed PMA disappears upon post-annealing of the films. The M-T measurement shows that the ferromagnetic transition temperatures of these materials are much higher than the room temperature.

研究了CoTbNi三元合金的制备及退火后的薄膜的结构和磁性。（Co _0.85 Tb _0.15） 通过共同溅射Ni元素和Co _0.85 Tb _0.15在Si衬底上生长x =（0.54，0.63，0.72，0.81 ）的_{1- x} Ni _x合金薄膜合金采用直流磁控溅射。如X射线衍射（XRD）测量所证实的，这些膜已经以无定形形式结晶。磁化强度与场强的测量结果表明，这些薄膜具有室温铁磁性。这些合金膜的磁性能强烈依赖于镍的浓度。可以看出，这些合金薄膜的饱和磁化强度和矫顽力随着薄膜中镍含量的增加而降低。显着特征之一是观察x的垂直磁各向异性（PMA） = 0.63和0.72薄膜。但是，观察到的PMA在薄膜退火后消失。MT测量表明，这些材料的铁磁转变温度远高于室温。