Active pharmaceutical ingredients (APIs) are only partially removed by convectional wastewater treatment plants. This study aimed at assessing the post‐treatment degradation of selected antibiotics and antiretroviral drugs by direct UV photolysis and advanced oxidation processes (UV/H₂O₂ and UV/Cl₂) using low‐pressure mercury lamp. The rate of degradation largely followed pseudo first‐order reaction kinetics. Amongst the six studied APIs, sulfamethoxazole, ciprofloxacin and zidovudine were readily degraded by more than 90% using direct UV photolysis. Addition of Cl₂ and H₂O₂ to the UV process led to an increase in the rate of degradation for all the compounds. The effectiveness UV/Cl₂ process was affected to a greater extent by the background effluent organic matter. This implies that higher electrical energy and oxidant would be required in the UV/Cl₂ process relative to UV/H₂O₂ process. Generally, electrical energy required to remove 90% of the target compounds increased in the order UV/H₂O₂ < UV/Cl₂ < UV processes.

中文翻译：

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用紫外线，紫外线/氯气和紫外线/过氧化氢对市政废水进行后处理时，去除某些抗生素和抗逆转录病毒药物

对流废水处理厂仅能部分除去活性药物成分（API）。这项研究旨在评估使用低压汞灯通过直接UV光解和先进的氧化过程（UV / H ₂ O ₂和UV / Cl ₂）对所选抗生素和抗逆转录病毒药物的治疗后降解。降解速率主要遵循拟一级反应动力学。在所研究的六个API中，磺胺甲恶唑，环丙沙星和齐多夫定很容易通过直接UV光解降解达90％以上。Cl ₂和H ₂ O _2的添加紫外线过程导致所有化合物的降解速率增加。UV / Cl ₂的有效过程在很大程度上受到背景污水有机物的影响。这意味着相对于UV / H ₂ O ₂工艺，在UV / Cl ₂工艺中将需要更高的电能和氧化剂。通常，去除90％的目标化合物所需的电能按UV / H ₂ O ₂ <UV / Cl ₂  <UV过程的顺序增加。