Abstract In the present article, a new surface treatment is proposed for pool boiling enhancement. For this purpose, a combination of hydrophilic–hydrophobic micropillar arrays with hydrophilic insulation strips between them is used to control and manage the thin film evaporation, surface rewetting, and bubble dynamics. The distance between hydrophobic sections of micropillars acts as permanent active nucleation site for pool boiling, which liquid thin films are established at the hydrophilic–hydrophobic interface. The hydrophilic section of micropillars is used for surface rewetting based on the wicking mechanism. The bubble dynamics is controlled by insulation strips to avoid the merging of departure bubbles and also vapor jets and columns. The effect of micropillar array dimensions on the pool boiling is investigated for the case of water on the hybrid silicon micropillar array. The maximum heat flux is 377.5 W/cm2 at 10 K wall superheat. Moreover, the variation of boiling heat flux is almost linear with respect to the wall superheat due to the permanent active nucleation sites. It leads to significant pool boiling enhancement at low superheat temperatures.

中文翻译：

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双亲微柱阵列的池沸腾增强：控制薄膜蒸发和再润湿流

摘要 在本文中，提出了一种新的表面处理方法来增强池沸腾。为此，亲水-疏水微柱阵列与它们之间的亲水绝缘条的组合用于控制和管理薄膜蒸发、表面再润湿和气泡动力学。微柱疏水部分之间的距离充当池沸腾的永久活性成核位点，在亲水-疏水界面处建立液体薄膜。微柱的亲水部分基于芯吸机制用于表面再润湿。气泡动力学由绝缘条控制，以避免离开气泡以及蒸汽射流和柱的合并。在混合硅微柱阵列上有水的情况下，研究了微柱阵列尺寸对池沸腾的影响。在 10 K 壁面过热时，最大热通量为 377.5 W/cm2。此外，由于永久的活性成核位点，沸腾热通量的变化几乎与壁过热呈线性关系。它导致在低过热温度下显着增强池沸腾。