Abstract

The conditions of fabrication of bismuth films with thickness from 5 to 30 μm by a melt spinning method were studied. The microstructure of the fabricated films in the cross section was analyzed using SEM. The Bi films with thickness more than 5 μm consisted of crystallites with sizes up to 30 μm and had a layered structure with crystal twins. The films with thickness of ~5 μm contained no crystallites, however, after annealing at 150–200°C for 1 h, there appeared bismuth nanocrystals with sizes from 10 to 100 nm. Annealing at higher temperatures promoted an increase in the size of nanocrystals and formation of crystallites of pyramidal shape with sizes up to 500 nm.

中文翻译：

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熔融纺丝法制备铋薄膜及其退火对其微观结构的影响

摘要

研究了通过熔融纺丝法制备厚度为5至30μm的铋膜的条件。使用SEM分析横截面中所制造的膜的微观结构。厚度大于5μm的Bi薄膜由尺寸最大为30μm的微晶组成，并具有晶体孪晶的层状结构。厚度约为5μm的薄膜不含微晶，但是在150–200°C退火1 h后，会出现尺寸为10至100 nm的铋纳米晶体。较高温度下的退火促进了纳米晶体尺寸的增加以及最大尺寸为500 nm的锥状微晶的形成。