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Periodic surface functional group density on graphene via laser-induced substrate patterning at Si/SiO 2 interface
Nano Research ( IF 9.9 ) Pub Date : 2020-06-16 , DOI: 10.1007/s12274-020-2852-3
Karolina A. Drogowska-Horna , Inam Mirza , Alvaro Rodriguez , Petr Kovaříček , Juraj Sládek , Thibault J.-Y. Derrien , Mindaugas Gedvilas , Gediminas Račiukaitis , Otakar Frank , Nadezhda M. Bulgakova , Martin Kalbáč

Controlling the spatial distribution of functional groups on 2D materials on a micrometer scale and below represents a fascinating opportunity to achieve anisotropic (opto)electronic properties of these materials. Periodic patterns of covalent functionalization can lead to periodic potentials in the monolayer; however, creating such superstructures is very challenging. Here, we describe an original approach to the periodic functionalization of graphene induced by substrate patterning using a pulsed laser. Laser-induced periodic surface structures (LIPSS) are produced on silicon wafers with thermally-grown oxide layers. The irradiation conditions for the formation of LIPSS confined at the SiO2/Si interface have been unravelled. LIPSS imprint their periodicity to the reactivity of the monolayer graphene placed on the substrate via modulation of its local doping level. This method is clean, straightforward and scalable with high spatial resolution.



中文翻译:

通过在Si / SiO 2界面上的激光诱导衬底图案化,石墨烯上的周期性表面官能团密度

控制微米级及以下的二维材料上官能团的空间分布,是实现这些材料的各向异性(光电)电子特性的绝佳机会。共价官能化的周期性模式可以导致单分子层中的周期性电势。但是,创建这样的上层建筑非常具有挑战性。在这里,我们描述了一种利用脉冲激光对基底图案进行诱导的石墨烯周期性功能化的原始方法。激光诱导的周期性表面结构(LIPSS)在具有热生长氧化物层的硅晶片上生产。限制在SiO 2上形成LIPSS的照射条件/ Si接口已被解散。LIPSS通过调节其局部掺杂水平,将其周期性刻印到放置在基板上的单层石墨烯的反应性上。该方法干净,直接且可扩展,具有高空间分辨率。

更新日期:2020-06-16
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