Multilayer CrN/CrAlN coatings were deposited on the 420-SS by the cathodic arc evaporation system with different duty cycles of bias-voltage. The deposited films were characterized by XRD and FESEM techniques. Mechanical, electrochemical, and surface properties of deposited films were studied by nano-indentation, electrochemical, and AFM analysis. Microstructure investigation confirmed the formation of adhesive and dense nanostructure multilayer film. Increasing the duty cycle led to the decrease in the coating grain size and promoted the hardness to 34.1 ± 4 GPa. A clear reduction of size and distribution of macroparticles was observed by using large repulsive force at a high duty cycle. By increasing the duty cycle, the coating deposition rate was increased from 1.23 to 1.38 µm/h and the surface roughness was decreased from 155 to 70 nm. The lower corrosion current density was obtained for the film applied at the 40% duty cycle (0.59 µA cm⁻²), which was about 10-order of magnitude less than the substrate.

通过阴极电弧蒸发系统以不同的偏压占空比在420-SS上沉积多层CrN / CrAlN涂层。通过XRD和FESEM技术表征沉积的膜。通过纳米压痕，电化学和AFM分析研究了沉积膜的机械，电化学和表面性能。微观结构研究证实了粘合剂和致密纳米结构多层膜的形成。占空比的增加导致涂层晶粒尺寸的减小，并使硬度达到34.1±4 GPa。通过在高占空比下使用大的排斥力，可以观察到大颗粒的大小和分布明显减小。通过增加占空比，涂层沉积速率从1.23增加到1.38 µm / h，表面粗糙度从155降低到70 nm。^-2），比基板小约10个数量级。