当前位置:
X-MOL 学术
›
Tech. Phys. Lett.
›
论文详情
Our official English website, www.x-mol.net, welcomes your
feedback! (Note: you will need to create a separate account there.)
The Influence of a Single Charged Interface Trap on the Subthreshold Drain Current in FinFETs with Different Fin Shapes
Technical Physics Letters ( IF 0.8 ) Pub Date : 2020-06-15 , DOI: 10.1134/s106378502005017x A. E. Abdikarimov
中文翻译:
单电荷接口陷阱对具有不同鳍形的FinFET中亚阈值漏极电流的影响
更新日期:2020-06-15
Technical Physics Letters ( IF 0.8 ) Pub Date : 2020-06-15 , DOI: 10.1134/s106378502005017x A. E. Abdikarimov
Abstract
The influence of the channel shape in a finned (vertical) field-effect transistor (FinFET) on the amplitude of random telegraph noise (RTN) induced by single interface trapped charge has been simulated for the transistors with rectangular and trapezoidal fin cross sections. It is established that, in a subthreshold region of gate voltages, a single charge trapped at the fin top induces RTN of lower amplitude in the case of a trapezoidal cross sections as compared to that in a transistor with rectangular cross sections. However, a single charge built in the middle of the fin side wall induces RTN of significantly higher amplitude in case of the fin with trapezoidal cross section.中文翻译:
单电荷接口陷阱对具有不同鳍形的FinFET中亚阈值漏极电流的影响