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Formation of residual droplets upon dip-coating of chemical and topographical surface patterns on partially wettable substrates
Chemical Engineering Science ( IF 4.1 ) Pub Date : 2020-12-01 , DOI: 10.1016/j.ces.2020.115832
M.A.C. van Gestel , B. He , A.A. Darhuber

Abstract We have studied the occurrence of residual liquid induced by the presence of defects during dip-coating of partially wettable surfaces. The defects are either topographical in nature such as surface protrusions or depressions, or chemically defined surface energy heterogeneities. Typically the residual liquid is distributed in a cascade of satellite droplets that arise from capillary break-up and the recession of the coating meniscus, after it is temporarily pinned by the defect. We characterize the volume and position of the largest satellite droplet as a function of the geometrical shape and size of the defect as well as its topographical amplitude or contact angle contrast. Our results are relevant for instance to immersion lithography, where the occurrence of residual droplets is undesirable.

中文翻译:

在部分可湿性基材上浸涂化学和地形表面图案时形成残留液滴

摘要 我们研究了部分可湿表面浸涂过程中由于缺陷的存在而引起的残留液体的发生。缺陷要么是自然地形,如表面突起或凹陷,要么是化学定义的表面能异质性。通常,残留液体分布在由毛细管破裂和涂层弯液面的衰退引起的一连串卫星液滴中,在它被缺陷暂时固定后。我们将最大卫星液滴的体积和位置表征为缺陷的几何形状和大小及其地形幅度或接触角对比度的函数。我们的结果与例如浸没式光刻有关,其中不希望出现残留液滴。
更新日期:2020-12-01
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