当前位置: X-MOL 学术Prot. Met. Phys. Chem. Surf. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Pulsed Magnetron Sputtering of Ceramic SHS Targets as a Promising Technique for Deposition of Multifunctional Coatings
Protection of Metals and Physical Chemistry of Surfaces ( IF 1.1 ) Pub Date : 2020-06-11 , DOI: 10.1134/s2070205120020124
Ph. V. Kiryukhantsev-Korneev

Abstract

The processes of the pulsed magnetron sputtering (PMS) of multicomponent ceramic targets are studied upon deposition of functional coatings of various purposes. The regularities of changes in the structural characteristics, as well as mechanical and tribological properties, under increasing magnetron power frequency are studied. Summarizing the results obtained using the PMS technology upon the deposition of coatings using multicomponent SHS cathodes, the following conclusions can be drawn. a) The structure of coatings. Pulsed sputtering leads to the development of a denser and, at the same time, more defective structure with a high level of internal stresses and roughness. The effect of the pulsed mode on the grain size depends on the sputtering type and configuration of magnetic fields. For reaction sputtering, structural refinement is observed in some cases. The effect of increasing the thickness of reaction coatings due to the commencement of interaction between atoms sputtered from the target and nitrogen atoms at precipitation and minimization of target surface poisoning is found. b) Coating properties. The effect of a pulsed mode on the adhesion strength of coatings is reduced to its decrease. Dependences of hardness and other mechanical properties on the frequency of the pulse power have an extreme character with a maximum at 50 kHz. The use of low frequencies (50–150 kHz) leads to a decrease in the friction factor. At the transition to the pulsed mode, the friction factor stabilizes during the test and, in most cases, wear resistance increases.


中文翻译:

陶瓷SHS靶的脉冲磁控溅射作为沉积多功能涂层的有前途的技术

摘要

在沉积各种用途的功能性涂层时,研究了多组分陶瓷靶材的脉冲磁控溅射(PMS)过程。研究了磁控管功率频率增加时结构特征以及机械和摩擦学性能变化的规律。总结使用多组分SHS阴极沉积涂层时使用PMS技术获得的结果,可以得出以下结论。a)涂层的结构。脉冲溅射导致具有较高内部应力和粗糙度的致密结构,同时缺陷结构也更多。脉冲模式对晶粒尺寸的影响取决于溅射类型和磁场配置。对于反应溅射,在某些情况下,可以观察到结构的细化。发现了由于从靶溅射出的原子与氮原子在沉淀时开始相互作用而增加反应涂层厚度的效果,并使靶表面中毒最小化。b)涂层性能。脉冲模式对涂层粘合强度的影响减小到减小的程度。硬度和其他机械性能对脉冲功率频率的依赖具有极端的特性,最大值为50 kHz。低频(50–150 kHz)的使用会导致摩擦系数的降低。在过渡到脉冲模式时,摩擦系数会在测试过程中稳定下来,并且在大多数情况下,耐磨性会提高。发现了由于从靶溅射出的原子与氮原子在沉淀时开始相互作用而增加反应涂层厚度的效果,并使靶表面中毒最小化。b)涂层性能。脉冲模式对涂层粘合强度的影响减小到减小的程度。硬度和其他机械性能对脉冲功率频率的依赖具有极端的特性,最大值为50 kHz。低频(50–150 kHz)的使用会导致摩擦系数的降低。在过渡到脉冲模式时,摩擦系数会在测试过程中稳定下来,并且在大多数情况下,耐磨性会提高。发现了由于从靶溅射出的原子与氮原子在沉淀时开始相互作用而增加反应涂层厚度的效果,并使靶表面中毒最小化。b)涂层性能。脉冲模式对涂层粘合强度的影响减小到减小的程度。硬度和其他机械性能对脉冲功率频率的依赖具有极端的特性,最大值为50 kHz。低频(50–150 kHz)的使用会导致摩擦系数的降低。在过渡到脉冲模式时,摩擦系数会在测试过程中稳定下来,并且在大多数情况下,耐磨性会提高。b)涂层性能。脉冲模式对涂层粘合强度的影响减小到减小的程度。硬度和其他机械性能对脉冲功率频率的依赖具有极端的特性,最大值为50 kHz。低频(50–150 kHz)的使用会导致摩擦系数的降低。在过渡到脉冲模式时,摩擦系数会在测试过程中稳定下来,并且在大多数情况下,耐磨性会提高。b)涂层性能。脉冲模式对涂层粘合强度的影响减小到减小的程度。硬度和其他机械性能对脉冲功率频率的依赖具有极端的特性,最大值为50 kHz。低频(50–150 kHz)的使用会导致摩擦系数的降低。在过渡到脉冲模式时,摩擦系数会在测试过程中稳定下来,并且在大多数情况下,耐磨性会提高。
更新日期:2020-06-11
down
wechat
bug