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Effect of nanodiamond size on γ-radiation resistance property of polysulfone-nanodiamond mixed-matrix membranes
Diamond and Related Materials ( IF 4.3 ) Pub Date : 2020-10-01 , DOI: 10.1016/j.diamond.2020.107963
Amita Bedar , Virendra Kumar , Anil K. Debnath , Naveen N. Kumar , Ratnesh Jain , Pradip K. Tewari , Ramesh C. Bindal , Soumitra Kar

Abstract Nanodiamond (ND) particles of different size (10, 250, and 500 nm) were used as filler materials for preparation of polysulfone-nanodiamond (Psf-ND) mixed-matrix membranes (MMMs), with loading of each ND particle varying from 0.1 to 2 wt% of polymer. Control Psf and MMMs were irradiated up to a γ-radiation dose of 1000 kGy. The effect of ND size was investigated on morphology, surface and mechanical properties, and performance of membranes in γ-radiation environment. The membranes were characterized by surface and cross-section SEM images, AFM, water contact angle studies, GPC, UTM, pure water permeability, and solute (PEO, 100 kDa) rejection measurements. The 10 nm sized ND enhanced the stability and performance of MMM up to 0.5% loading, while higher loading of it led to agglomeration of ND, and in-turn the deterioration of membrane performance. ND with larger particle size (250 and 500 nm), though dispersed homogeneously in the membrane matrix, but resulted in interfacial defects between ND and Psf host membrane matrix. The MMM with an optimum 0.5% loading of ND10 particles offered ~5 times enhanced radiation stability, as compared to that of control Psf membrane. This is the first of its kind study reported herein that provides an insight into the effect of ND particle size in altering the radiation resistance behaviour of MMMs.

中文翻译:

纳米金刚石粒径对聚砜-纳米金刚石混合基质膜抗γ-辐射性能的影响

摘要 使用不同尺寸(10、250 和 500 nm)的纳米金刚石 (ND) 颗粒作为填料制备聚砜-纳米金刚石 (Psf-ND) 混合基质膜 (MMM),每个 ND 颗粒的负载量从0.1 至 2 重量%的聚合物。对照 Psf 和 MMM 的辐照剂量高达 1000 kGy。研究了 ND 尺寸对膜在 γ 辐射环境中的形态、表面和机械性能以及性能的影响。通过表面和横截面 SEM 图像、AFM、水接触角研究、GPC、UTM、纯水渗透率和溶质(PEO,100 kDa)截留测量来表征膜。10 nm 尺寸的 ND 提高了 MMM 的稳定性和性能,最高可达 0.5% 的负载,而更高的负载导致 ND 的团聚,进而导致膜性能的恶化。具有较大粒径(250 和 500 nm)的 ND,虽然均匀分散在膜基质中,但导致 ND 和 Psf 基质膜基质之间的界面缺陷。与对照 Psf 膜相比,具有最佳 0.5% ND10 颗粒负载量的 MMM 提供了约 5 倍的辐射稳定性。这是本文报道的同类研究中的第一项,它提供了对 ND 粒径在改变 MMM 的抗辐射行为方面的影响的见解。与对照 Psf 膜相比。这是本文报道的同类研究中的第一项,它提供了对 ND 粒径在改变 MMM 的抗辐射行为方面的影响的见解。与对照 Psf 膜相比。这是本文报道的同类研究中的第一项,它提供了对 ND 粒径在改变 MMM 抗辐射行为方面的影响的见解。
更新日期:2020-10-01
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