Abstract We report on the chemical reduction (cR) of graphene oxide (GO) by the solvothermal method at 180 °C using two similar amide solvents, dimethylformamide (DMF) and dimethylacetamide (DMA). One of the differences between the obtained cRGO nanostructures is their solubility in polar solvents. This can be related to the quantity of decomposed amide molecules into carbon monoxide (CO), a reducing agent, and amine molecules of the employed solvents. The amount of reactive agent generated with DMA during the solvothermal reduction process is lower than those resulting from the use of DMF. Thus, a large (small) quantity of oxygen groups in GO sheets is removed using DMF (DMA) as reducing agent. The removal of oxygen groups from GO sheets, due to interaction with CO, creates CO2 molecules and some of them are trapped between cRGO nanocrystals. Despite vacancy creations in graphene sheets, via CO2, the average size of GO sheets is preserved during the reduction process, indicating the tendency of CO to heal vacancies in the graphene lattice. Moreover, different GO concentrations have been used to study the reduction efficiency of these solvents. Average sizes of cRGO sheets as well as their graphitization are similar for both solvents, showing that the influence of GO concentrations in the cRGO crystallinity is limited.

中文翻译：

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使用溶剂热法化学还原氧化石墨烯过程中酰胺溶剂分解导致 CO2 的形成和捕集

摘要 我们报告了使用两种相似的酰胺溶剂二甲基甲酰胺 (DMF) 和二甲基乙酰胺 (DMA) 在 180 °C 下通过溶剂热法对氧化石墨烯 (GO) 进行化学还原 (cR)。获得的 cRGO 纳米结构之间的差异之一是它们在极性溶剂中的溶解度。这可能与分解成一氧化碳 (CO)、还原剂和所用溶剂的胺分子的酰胺分子的数量有关。在溶剂热还原过程中用 DMA 产生的反应剂的量低于使用 DMF 产生的那些。因此，使用 DMF (DMA) 作为还原剂去除了 GO 片中大量（少量）的氧基团。由于与 CO 相互作用，从 GO 片中去除氧基团会产生 CO2 分子，其中一些被困在 cRGO 纳米晶体之间。尽管石墨烯片中产生了空位，但通过 CO2，GO 片的平均尺寸在还原过程中得以保留，表明 CO 有修复石墨烯晶格中空位的趋势。此外，不同的 GO 浓度已被用于研究这些溶剂的还原效率。两种溶剂的 cRGO 片的平均尺寸及其石墨化相似，表明 GO 浓度对 cRGO 结晶度的影响是有限的。