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One-step hydrothermal fabrication of SrMoO4/MoS2 composites with strong interfacial contacts for efficient photoreduction removal of Cr(VI)
CrystEngComm ( IF 2.6 ) Pub Date : 2020-06-04 , DOI: 10.1039/d0ce00314j
Yiming Zhang 1, 2, 3, 4, 5 , Xiaoyan Yang 5, 6, 7, 8 , Peng Zhang 3, 4, 5, 6, 9 , Dan Liu 3, 4, 5, 6, 9 , Yonglin Wang 3, 4, 5, 6, 9 , Zhouzheng Jin 1, 2, 3, 4, 5 , Bhekie B. Mamba 10, 11, 12, 13 , Alex T. Kuvarega 10, 11, 12, 13 , Jianzhou Gui 1, 2, 3, 4, 5
Affiliation  

Aimed at alleviating severe recombination of photogenerated electron/hole pairs in MoS2 photocatalysts, one-pot hydrothermal preparation of SrMoO4/MoS2 composites was successfully achieved in this study. It was found that numerous MoS2 nanosheets were in situ grown on the surface of bulk SrMoO4; meanwhile, XPS and Raman analyses indicated that a strong interfacial effect was generated between bulk SrMoO4 and MoS2 nanosheets in 8%-SrMoO4/MoS2 composites. Moreover, the intense heterojunction interface of 8%-SrMoO4/MoS2 composites greatly promotes the separation of photoinduced electron–hole pairs and speeds up the transfer of photoinduced charge carriers. Compared with pure MoS2 and bulk SrMoO4 photocatalysts, the series of x-SrMoO4/MoS2 composites possess enhanced photoreduction activities, especially the 8%-SrMoO4/MoS2 photocatalyst displays optimal removal efficiency of Cr(VI) (91.2%) and excellent photostability under visible light irradiation. As a matter of fact, an in situ hybrid process occurs during the preparation of 8%-SrMoO4/MoS2 composites, resulting in intense interfacial contacts, which mainly endow them with superior photocatalytic performance. Finally, the photocatalytic mechanism is studied to illustrate the efficient transfer of photoinduced electron/hole pairs and the removal process of Cr(VI).

中文翻译:

具有强界面接触的SrMoO4 / MoS2复合材料的一步式水热制备,可有效地光还原去除Cr(VI)

为了缓解MoS 2光催化剂中光生电子/空穴对的严重复合,成功完成了一锅水热法制备SrMoO 4 / MoS 2复合材料。发现大量的MoS 2纳米片原位生长在块状SrMoO 4表面; 与此同时,XPS和拉曼分析表明,在散装SrMoO之间产生强的界面效应4和MoS 2个在8%-SrMoO纳米片4 / MOS 2层的复合材料。此外,8%-SrMoO 4 / MoS 2的强异质结界面复合材料极大地促进了光致电子-空穴对的分离,并加速了光致电荷载流子的转移。与纯MoS 2和块状SrMoO 4光催化剂相比,该系列x -SrMoO 4 / MoS 2复合材料具有增强的光还原活性,特别是8%-SrMoO 4 / MoS 2光催化剂显示出最佳的Cr(VI)去除率(91.2% ),并在可见光照射下具有出色的光稳定性。实际上,制备8%-SrMoO 4 / MoS 2的过程中会发生原位杂化过程复合材料,导致强烈的界面接触,这主要使它们具有出色的光催化性能。最后,研究了光催化机理,以说明光致电子/空穴对的有效转移以及Cr(VI)的去除过程。
更新日期:2020-07-06
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