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Prediction of midfrequency sputtering cathode erosion position with vertical magnetic field
Surface Engineering ( IF 2.4 ) Pub Date : 2020-04-16 , DOI: 10.1080/02670844.2020.1747752
Yun-peng He 1 , Shi-bo Bi 1 , Ji-ping Yin 1 , Shao-bo Lv 2 , Rui-sheng Wang 3 , Zeng Lin 1, 4
Affiliation  

In this paper, the etching position of a target was predicted using magnetic field simulation. The magnetic field distribution was simulated with the finite element analysis method, the distributio...

中文翻译:

用垂直磁场预测中频溅射阴极腐蚀位置

在本文中,使用磁场模拟来预测目标的蚀刻位置。磁场分布采用有限元分析方法进行模拟,分布...
更新日期:2020-04-16
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