Abstract The adsorption of eight structurally different secondary and tertiary amides (N-ethyl formamide, N-methyl-propionamide, N-cyclohexyl formamide, N-tert-Butyl-formamide, N-Methyl-benzamide, N-Pentyl-benzamide, N,N-dimethyl acetamide and N,N-diethyl dodecanamide) from carbon tetrachloride solution on mesoporous silica (MS) material was investigated by kinetic FTIR spectroscopic measurements. Of the tested amides, N-methyl-propionamide showed the highest affinity for the MS material. The results indicate that tertiary amides show low affinity for the surface interaction with MS while the affinity of secondary amides decreases with the increase in the volumeof substituents. This result is correlated to the capability of amide N-H to participate in hydrogen bonding with the MS surface. Results of FTIR spectroscopy evidence the presence of amides adsorbed on the surface of MS while the analysis of hyperspectral images reveals the possibility of constructing effective qualitative hyperspectral sensors for amides based on MS as a sensing substrate.

中文翻译：

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使用 FTIR 光谱和高光谱成像研究选定的酰胺与介孔二氧化硅的表面相互作用

摘要 八种结构不同的仲和叔酰胺（N-乙基甲酰胺、N-甲基-丙酰胺、N-环己基甲酰胺、N-叔丁基-甲酰胺、N-甲基-苯甲酰胺、N-戊基-苯甲酰胺、N、通过动力学 FTIR 光谱测量研究了在介孔二氧化硅 (MS) 材料上来自四氯化碳溶液的 N-二甲基乙酰胺和 N,N-二乙基十二酰胺。在测试的酰胺中，N-甲基-丙酰胺对 MS 材料显示出最高的亲和力。结果表明，叔酰胺与MS的表面相互作用显示出低亲和力，而仲酰胺的亲和力随着取代基体积的增加而降低。该结果与酰胺 NH 参与与 MS 表面的氢键结合的能力相关。