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The Effect of TMEDA on the Structural, Optical and Electrochemical Properties of CuI Embedded in Polyvinyl alcohol Nanocomposite Films
Polymer Science, Series A ( IF 1.0 ) Pub Date : 2020-03-05 , DOI: 10.1134/s0965545x2003013x
T. S. Soliman , Sh. I. Elkalashy , T. Y. Elrasasi , M. K. El-Mansy

Abstract

In the present paper, a CuI nanoparticle was grown in a polyvinyl alcohol (PVA) solution using tetramethylethylenediamine (TMEDA) as a crystal growth inhibitor. The effect of TMEDA on the structural, optical and electrochemical properties of CuI/PVA was investigated using X-ray diffraction (XRD), a scanning and transmission electron microscopy, UV–Vis spectroscopy, and cyclic voltammetry techniques. XRD showed the growth of CuI nanoparticles to about 10 nm in size for higher CuI concentrations (10 wt %). Optical absorption showed a direct transition, with direct optical band gap values decreasing from 1.6 to 1.5 and from 1.62 to 1.5 eV for colloidal and solid films, respectively. Cyclic voltammetry measurements have been conducted to ascertain the position of both the HOMO and LUMO levels, and the chemical band gap was found in the range 2.58–3.30 eV with varying CuI concentration.



中文翻译:

TMEDA对嵌入聚乙烯醇纳米复合薄膜中CuI的结构,光学和电化学性能的影响

摘要

在本文中,使用四甲基乙二胺(TMEDA)作为晶体生长抑制剂,在聚乙烯醇(PVA)溶液中生长了CuI纳米颗粒。使用X射线衍射(XRD),扫描和透射电子显微镜,紫外可见光谱和循环伏安法研究了TMEDA对CuI / PVA的结构,光学和电化学性质的影响。XRD显示,对于较高的CuI浓度(10 wt%),CuI纳米颗粒的尺寸增长到大约10 nm。光学吸收显示出直接跃迁,对于胶体和固体膜,直接光学带隙值分别从1.6降低至1.5 eV和从1.62降低至1.5 eV。已经进行了循环伏安法测量以确定HOMO和LUMO含量的位置,化学带隙在2.58–3范围内。

更新日期:2020-03-05
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