Abstract

The comparative research of the parameters, steady-state composition, and the effects of heterogeneous interaction in the plasma of fluorocarbon gases C_xH_yF_z with various z/x relations in conditions of an induction RF (13.56 MHz) discharge is carried out. The binary systems C_xH_yF_z + Ar based on CF₄ (z/x = 4), CHF₃ (z/x = 3), and C₄F₈ (z/x = 2) are used as the subjects of research. Through the methods of diagnostics and simulation of plasma we found (a) the reasons of the differences in the physical parameters (temperature and density of electrons, energy of ion bombardment) of the plasma in the studied systems; (b) the special characteristics of the kinetics of the plasma-chemical processes determining the steady state concentrations of fluorine atoms and polymer-forming radicals; and (c) the special characteristics of the kinetics of the heterogeneous process forming the output parameters (rate, selectivity, anisotropy) of the reactive ion etching of Si and SiO₂.

中文翻译：

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关于碳氟化合物气体类型对反应离子刻蚀工艺输出特性的影响

摘要

在感应射频（13.56 MHz）放电条件下，对具有各种z / x关系的碳氟化合物气体C _x H _y F _z的参数，稳态成分以及等离子体中的异质相互作用的影响进行了比较研究。 。基于CF ₄（z / x = 4），CHF ₃（z / x = 3）和C ₄ F ₈（z / x）的二元系统C _x H _y F _z + Ar= 2）被用作研究对象。通过等离子体的诊断和模拟方法，我们发现：（a）研究系统中等离子体物理参数（温度和电子密度，离子轰击能量）差异的原因；（b）等离子化学过程动力学的特殊特性决定了氟原子和形成聚合物的自由基的稳态浓度；（c）形成Si和SiO ₂的反应性离子蚀刻的输出参数（速率，选择性，各向异性）的异质过程动力学的特殊特征。