Abstract

The effect of annealing temperature on the properties of silver thin films has been investigated. Ag thin films have been deposited on glass substrates by electron beam coating, afterward subjected to annealing in a mixed ambient of air and oxygen at 100, 200, 300, 400 and 500°C for 3 h and then cooled slowly. The crystallographic structures of the Ag thin films were studied as a function of the annealing temperature. X‑ray diffraction (XRD) was used to estimate the crystallographic texture and grain size. All the films were found to have crystalline structure. The film microstructures were studied by scanning electron microscopy (SEM). The XRD and SEM results confirmed the presence of silver particles in the thin films. The optical and morphological properties and elemental composition of samples were analysed using of the ultra-violet and visible (UV–vis) spectroscopy, atomic force microscopy (AFM), transmittance electron microscopy analysis (TEM) and energy dispersive X-ray analysis (EDS) which gave results in agreement with XRD and SEM results.

中文翻译：

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电子束技术沉积银薄膜的物理分析

摘要

研究了退火温度对银薄膜性能的影响。Ag薄膜已通过电子束涂层沉积在玻璃基板上，然后在空气和氧气的混合环境中分别于100、200、300、400和500°C退火3小时，然后缓慢冷却。研究了Ag薄膜的晶体结构与退火温度的关系。X射线衍射（XRD）用于估计晶体织构和晶粒尺寸。发现所有膜都具有晶体结构。通过扫描电子显微镜（SEM）研究了膜的微观结构。XRD和SEM结果证实了薄膜中存在银颗粒。