Abstract In this communication, we report the dielectric response of pulsed laser deposition (PLD) grown Y0·95Sr0·05MnO3 (YSMO) manganite thin films (having two different thickness i.e. ~200 & 300 nm) on single crystalline Nb:SrTiO3 (SNTO) substrates. These films were irradiated by 200 MeV Ag+15 ions with different ion fluence. Structural studies, using X–ray diffraction (XRD) measurement, reveal single phase nature without any detectable impurity within the measurement range studied. Atomic force microscopy (AFM) images reveal that grain size and grain boundaries are highly influenced by the SHI ion fluences and film's thickness. Variations in dielectric constant with frequency, ion fluence, and film thickness have been discussed in the context of structural strain at the film–substrate interface, defect density and structural disorder in films. To understand the dielectric response of all the films with the help of universal dielectric response (UDR) model while cole-cole plots have been studied for the relaxation mechanisms.

中文翻译：

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200MeV Ag+15离子辐照对Y0.95Sr0.05MnO3锰酸盐薄膜结构、微观结构和介电性能的影响

摘要 在本文中，我们报告了脉冲激光沉积 (PLD) 在单晶 Nb:SrTiO3 (SNTO) 上生长的 Y0·95Sr0·05MnO3 (YSMO) 锰酸盐薄膜（具有两种不同的厚度，即 ~200 和 300 nm）的介电响应基材。这些薄膜被具有不同离子注量的 200 MeV Ag+15 离子照射。使用 X 射线衍射 (XRD) 测量的结构研究揭示了单相性质，在研究的测量范围内没有任何可检测的杂质。原子力显微镜 (AFM) 图像显示晶粒尺寸和晶界受 SHI 离子通量和薄膜厚度的高度影响。介电常数随频率、离子注量和薄膜厚度的变化已经在薄膜-基板界面的结构应变的背景下进行了讨论，薄膜中的缺陷密度和结构无序。借助通用介电响应 (UDR) 模型了解所有薄膜的介电响应，同时研究了弛豫机制的科尔-科尔图。