Abstract Detecting the inner structures in the perpendicularly orientated block copolymer (BCP) films is beneficial to understand the in-depth arrangement of nano-domains. This study presents a method to reverse the perpendicularly orientated polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCP films for observing their bottom morphologies. Only PS brush or mat was used as neutral substrates, because strongly polar groups inside the PS chains exposed to balance the interfacial energies of PS-OH chemical substrates. The perpendicular window for fingerprint morphology of PS-b-PMMA BCP was among 1.16∼1.44 nm of PS brush on silicon wafer with silanol group. For crosslinked PS mat on water soluble substrate of sodium polyacrylate, however, perpendicular window was shortened to be around 1.37 nm, which was confirmed by both interfacial energy and images of scanning electron microscope (SEM). The bottom views of PS-b-PMMA block copolymer films with perpendicular and mixed orientation were observed freshly. There was no obvious difference between the fingerprints of top and bottom, indicating that perpendicular orientation in the block copolymer was through the film up to down. Therefore, the challenges of degrees of perfection from directed assembly of various morphologies are deduced to be originated from match of the morphology with the e-beamed prepattern or defects in the prepattern.

中文翻译：

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由超薄聚苯乙烯基材垂直取向的可逆聚苯乙烯-嵌段-聚（甲基丙烯酸甲酯）共聚物薄膜

摘要 检测垂直取向嵌段共聚物（BCP）薄膜的内部结构有利于了解纳米域的深入排列。本研究提出了一种反转垂直取向的聚苯乙烯-嵌段-聚（甲基丙烯酸甲酯）（PS-b-PMMA）BCP 薄膜以观察其底部形态的方法。只有 PS 刷或垫用作中性基材，因为 PS 链内的强极性基团暴露以平衡 PS-OH 化学基材的界面能。PS-b-PMMA BCP指纹形貌的垂直窗口在具有硅烷醇基团的硅片上PS刷的1.16~1.44 nm之间。然而，对于聚丙烯酸钠水溶性基材上的交联 PS 垫，垂直窗口缩短至 1.37 nm 左右，界面能和扫描电子显微镜 (SEM) 图像均证实了这一点。新鲜观察具有垂直和混合取向的PS-b-PMMA嵌段共聚物膜的底视图。上下指纹没有明显差异，表明嵌段共聚物的垂直取向是从上到下穿过薄膜。因此，各种形态的定向组装的完美程度的挑战被推断源于形态与电子束预制图案的匹配或预制图案中的缺陷。表明嵌段共聚物中的垂直取向是从上到下穿过薄膜。因此，各种形态的定向组装的完美程度的挑战被推断源于形态与电子束预制图案的匹配或预制图案中的缺陷。表明嵌段共聚物中的垂直取向是从上到下穿过薄膜。因此，各种形态的定向组装的完美程度的挑战被推断源于形态与电子束预制图案的匹配或预制图案中的缺陷。