Pure Cr and Cr–WC coatings are electrodeposited by both direct current (DC) and pulse current (PC) methods. The deposition was carried out with different (0, 3 and 5 kHz) pulse frequencies with varying nano-sized tungsten carbide (WC) loading (0, 3, 5 and 7 g l −1 ) of the electrolytic bath. X-ray diffraction (XRD) results of the coatings display Cr coating with BCC structure along with minor WC peak after the enlargement of the peaks. Scanning electron microscope (SEM) images depict uniform and finer morphology for the coatings prepared at 3 kHz pulsing conditions. However, the coatings prepared at 5 kHz pulse show non-uniform coarse morphology. All the coatings display low surface roughness i.e. <1 μ m. The hardness result of the coatings was mainly depended on WC incorporation. The Cr–WC coatings show excellent tribological properties, unlike pure Cr coating. After analysis of all the properties, it is observed that Cr-5 g l −1 WC (3 kHz) shows opt...

中文翻译：

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脉冲电沉积Cr–WC涂层的结构和性能

纯Cr和Cr–WC涂层通过直流（DC）和脉冲电流（PC）方法进行电沉积。以不同的（0、3和5kHz）脉冲频率进行沉积，并且改变电解槽的纳米尺寸的碳化钨（WC）负荷（0、3、5和7gl -1）。涂层的X射线衍射（XRD）结果显示出具有BCC结构的Cr涂层以及峰扩大后的次要WC峰。扫描电子显微镜（SEM）图像描绘了在3 kHz脉冲条件下制备的涂层的均匀且精细的形貌。然而，以5kHz脉冲制备的涂层显示出不均匀的粗糙形态。所有涂层均显示出低的表面粗糙度，即<1μm。涂层的硬度结果主要取决于WC的掺入。Cr-WC涂层具有出色的摩擦学性能，不像纯铬涂层。对所有特性进行分析后，观察到Cr-5 gl -1 WC（3 kHz）显示出最佳性能。