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Fabrication and characterization of porous WO3 thin film as a high accuracy cyclohexene sensor
Materials Science in Semiconductor Processing ( IF 4.2 ) Pub Date : 2020-11-01 , DOI: 10.1016/j.mssp.2020.105220
K. Khojier , S. Zolghadr , F. Teimoori , S. Goudarzi

Abstract In the last decade, an increase of attention to monitoring the hazardous gases and vapors in industry, laboratories, and homes has attracted extensive interest in developing gas sensors. This research investigates the use of porous WO3 thin film as a high accuracy cyclohexene sensor. Oblique deposition and subsequently the post-annealing process were employed to produce the mentioned device. X-ray diffraction (XRD), atomic force microscopy (AFM), and physical adsorption isotherm were used to investigate the crystallographic structure, surface morphology, and porosity of the sample, respectively. Sensing parameters including response amplitude, operating temperature, response and recovery times, detection limit, selectivity, reproducibility, and stability were also studied to find a deep-perception of the device sensing performance. The results disclose that the prepared device in this research shows a decent and fast response to the object and can be introduced as a reliable cyclohexene sensor.

中文翻译:

作为高精度环己烯传感器的多孔 WO3 薄膜的制备和表征

摘要 在过去的十年中,对工业、实验室和家庭中有害气体和蒸汽监测的日益关注引起了对开发气体传感器的广泛兴趣。本研究调查了使用多孔 WO3 薄膜作为高精度环己烯传感器。采用倾斜沉积和随后的后退火工艺来生产上述器件。X射线衍射(XRD)、原子力显微镜(AFM)和物理吸附等温线分别用于研究样品的晶体结构、表面形貌和孔隙率。还研究了包括响应幅度、工作温度、响应和恢复时间、检测限、选择性、再现性和稳定性在内的传感参数,以深入了解器件的传感性能。
更新日期:2020-11-01
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