Here, in the aim to replace long perfluorinated chains (C₈F₁₇) in polymer we use both a short C₄F₉ perfluorinated chain and a hydrocarbon chain a various length (from C₂ to C₁₂). These chains are grafted to thieno[3,4-b]thiophene monomers to perform electrodeposited conducting polymer films with high hydrophobic properties. Two solvents are used: dichloromethane (CH₂Cl₂) and dichloromethane saturated with water (CH₂Cl₂ + H₂O) in order to release also in-situ O₂ and/ or H₂ gas bubbles. In CH₂Cl₂, spherical particles covering the surface are observed with short alkyl chains and large wrinkles with long alkyl chains. The highest hydrophobicity θ_w = 139.3° are obtained with Thieno-F₄-C₆ after 5 deposition scans, which presents also strong water adhesion. In CH₂Cl₂ + H₂O, the surfaces are smoother and traces of very large bubbles are present but only with short alkyl chains. However, the polymer growth is inhomogeneous because the substituents are too flexible to stabilize the released gas bubbles. The preliminary results are encouraging and more rigid substituents or spacers could be envisaged in the future to induce homogenous porous structures.

在此，为了替换聚合物中的长全氟化链（C ₈ F ₁₇），我们同时使用了短的C ₄ F ₉全氟化链和各种长度（从C ₂至C ₁₂）的烃链。这些链被接枝到噻吩并[3,4- b ]噻吩单体上，以执行具有高疏水性的电沉积导电聚合物薄膜。两种溶剂被使用：二氯甲烷（CH ₂氯₂）和二氯甲烷与水饱和的（CH ₂氯₂ + H ₂ O），以便也释放原位Ò ₂和/或H_2个气泡。在CH ₂ Cl _2中，观察到覆盖有表面的球形颗粒具有短的烷基链和具有长的烷基链的大皱纹。最高疏水θ_瓦特 = 139.3°与噻吩并-F得到的₄ -C ₆ 5沉积扫描，其呈现也强水粘合后。在CH _2中Cl ₂ + H ₂○，表面更光滑，并且存在痕量非常大的气泡，但只有短的烷基链。然而，由于取代基太柔韧性以至于不能稳定所释放的气泡，所以聚合物的生长是不均匀的。初步结果令人鼓舞，将来可以设想使用更刚性的取代基或间隔基来诱导均质的多孔结构。