The main challenge in the deposition of molybdenum thin films for high efficiency in copper indium gallium selenide (CIGS) modules lies in gaining an adherent coating without compromising conductivity and reflectance characteristics. In this study, Mo thin films were deposited on soda-lime glass by DC magnetron sputtering at different deposition power (55, 100, 200 and 300 W) and with high working gas pressure (2 and 4 Pa). Analytical techniques such as X-ray diffraction (XRD), scanning electron microscopy (SEM) and Hall effect were employed to analyze the structure, morphology and electrical resistivity of the deposited films. Ultraviolet–visible (UV–Vis) spectrometry was performed to measure the reflectance and a cross-hatch adhesion tape test was employed to determine the adhesion behavior of deposited films. With higher sputtering power and reduced gas pressure, an increase in the crystallite size of the deposited films was observed. Films deposited at higher gas pressure were found with tensile stresses and higher adhesion with the substrate. The van der Pauw method reveals an increase in conductivity at high power and low gas pressure. Improved reflectance was achieved at moderate sputtering power and low gas pressure.

为了在硒化铜铟镓（CIGS）模块中高效沉积钼薄膜，主要挑战在于获得粘附涂层而又不影响电导率和反射率特性。在这项研究中，通过直流磁控溅射在不同的沉积功率（55、100、200和300 W）和高工作气压（2和4 Pa）下，将Mo薄膜沉积在钠钙玻璃上。X射线衍射（XRD），扫描电子显微镜（SEM）和霍尔效应等分析技术被用于分析沉积膜的结构，形态和电阻率。进行紫外可见（UV-Vis）光谱测量以测量反射率，并使用交叉影线粘合带测试来确定沉积膜的粘合行为。随着更高的溅射功率和降低的气压，观察到沉积膜的微晶尺寸增加。发现在较高气压下沉积的膜具有张应力和与基材的较高粘附性。Van der Pauw方法揭示了在高功率和低气压下电导率的增加。在适中的溅射功率和低气压下获得了改善的反射率。