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Zeta Potential Dependent Self-Assembly for Very Large Area Nanosphere Lithography.
Nano Letters ( IF 9.6 ) Pub Date : 2020-05-28 , DOI: 10.1021/acs.nanolett.0c01277
Gabriel Cossio 1 , Edward T Yu 1
Affiliation  

Nanosphere lithography offers a rapid, low-cost approach for patterning of large-area two-dimensional periodic nanostructures. However, a complete understanding of the nanosphere self-assembly process is necessary to enable further development and scaling of this technology. The self-assembly of nanospheres into two-dimensional periodic arrays has previously been attributed solely to the Marangoni force; however, we demonstrate that the ζ potential of the nanosphere solution is critically important for successful self-assembly to occur. We discuss and demonstrate how this insight can be used to greatly increase self-assembled 2D periodic array areas while decreasing patterning time and cost. As a representative application, we fabricate antireflection nanostructures on a transparent flexible polymer substrate suitable for use as a large-area (270 cm2), broadband, omnidirectional antireflection film.

中文翻译:

大面积纳米球平版印刷的Zeta势相关自组装。

纳米球光刻技术为形成大面积二维周期性纳米结构的图案提供了一种快速,低成本的方法。但是,对纳米球自组装过程的完整理解对于实现该技术的进一步发展和规模化是必不可少的。纳米球自组装成二维周期阵列的过程以前仅归因于马兰戈尼力;这是由于纳米球的自组装。然而,我们证明了纳米球溶液的ζ电位对于成功进行自组装至关重要。我们讨论并演示了如何利用这种洞察力来大大增加自组装2D周期阵列的面积,同时减少构图时间和成本。作为代表性的应用,2),宽带全向减反射膜。
更新日期:2020-07-08
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