The paper deals with the study of the structure and properties of tantalum coatings formed by electron beam evaporation and deposition of tantalum powder on 300–450 °C aluminum substrate. The research results of surface morphology, phase and elemental composition show that high activity of an aluminum substrate and specific conditions for vapor-phase technology promote formation of tantalum coatings characterized by a high degree of crystalline grains, with high adhesion and hardness despite the surface cracks. It was observed that the optimum deposition temperature of tantalum on aluminum substrates varies from 300 °C to 350 °C. These coatings demonstrate excellent physical and mechanical properties due to formation of intermetallic phases in the reactive zone.

中文翻译：

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电子束技术在铝基板上获得的钽涂层的结构与性能

本文研究了通过电子束蒸发和钽粉在300–450°C铝基板上沉积而形成的钽涂层的结构和性能。表面形态，相和元素组成的研究结果表明，铝基材的高活性和气相技术的特定条件促进了钽涂层的形成，该钽涂层具有高晶粒度，尽管存在表面裂纹也具有高附着力和硬度。据观察，钽在铝基板上的最佳沉积温度在300°C至350°C之间变化。这些涂层由于在反应区中形成金属间相而具有出色的物理和机械性能。