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Influence of adhesion intermediate layers on the stability of nanodiamond composite films deposited on Si substrates by coaxial arc plasma
Applied Physics Express ( IF 2.3 ) Pub Date : 2020-05-25 , DOI: 10.35848/1882-0786/ab91d1
Ali M. Ali 1, 2 , Mohamed Egiza 1, 3 , Koki Murasawa 1, 4 , Hiroaki Sugita 4 , Tanja Deckert-Gaudig 5 , Volker Deckert 5, 6, 7 , Tsuyoshi Yoshitake 1
Affiliation  

Nanodiamond composite (NDC) films deposited on silicon substrates by coaxial arc-plasma deposition at room temperature are easily peeled off with increasing film thickness. This research adapted additional NDC intermediate layers deposited at high temperatures, to induce atomic interdiffusion towards the Si substrates, which effectively enhances the adhesion of the intermediate layers with the substrates. In addition, the intermediate layers exhibit low residual stresses and hardnesses, and they can relieve large stresses of the top hard-layers. Consequently, the deposition of1.5 μ m thickness and 55 GPa hardness of NDC films on silicon substrates is possible, which opens up their applications in micro-electro-mechanical-systems and biosensors.

中文翻译:

粘合中间层对同轴电弧等离子体沉积在Si衬底上的纳米金刚石复合膜稳定性的影响

随着膜厚的增加,在室温下通过同轴电弧等离子体沉积在硅基板上沉积的纳米金刚石复合材料(NDC)膜很容易剥离。这项研究采用了在高温下沉积的其他NDC中间层,以诱导原子向Si衬底的相互扩散,从而有效地增强了中间层与衬底的附着力。另外,中间层表现出低的残余应力和硬度,并且它们可以减轻顶部硬层的大应力。因此,可以在硅基板上沉积1.5μm的厚度和55 GPa硬度的NDC膜,这开辟了它们在微机电系统和生物传感器中的应用。
更新日期:2020-05-25
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