Abstract In order to realize dual-periodic microstructured surfaces, which are required for next-generation multi-functional surfaces for various fields, multi-exposure laser interference lithography (MELIL) is recognized as one of the potential fabrication methods. However, MELIL has one critical problem that it is difficult to adjust each exposure energy for adequate multiple exposures before the development process. To solve this critical problem, we proposed an application of special optical in-process measurement, allowing us to control each exposure condition properly during its exposure process, and experimentally verified its feasibility by generating a desired dual-periodic microstructured surface using the proposed developed system with an in-process measurement unit.

中文翻译：

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基于光学在线测量的高级功能双周期微结构表面

摘要 为了实现各种领域的下一代多功能表面所需的双周期微结构表面，多次曝光激光干涉光刻（MELIL）被认为是潜在的制造方法之一。然而，MELIL 有一个关键问题，即在显影过程之前很难调整每个曝光能量以获得足够的多次曝光。为了解决这个关键问题，我们提出了一种特殊的光学过程中测量的应用，使我们能够在曝光过程中正确控制每个曝光条件，并通过使用所提出的开发系统生成所需的双周期微结构表面来实验验证其可行性带有在线测量单元。