Photocatalytic Production of Hypochlorous Acid over Pt/WO3 under Simulated Solar Light,ACS Sustainable Chemistry & Engineering

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Photocatalytic Production of Hypochlorous Acid over Pt/WO3 under Simulated Solar Light
ACS Sustainable Chemistry & Engineering ( IF 7.1 ) Pub Date : 2020-05-19 , DOI: 10.1021/acssuschemeng.0c01341
Rui Pang ₁ , Yugo Miseki ₁ , Sayuri Okunaka ₁ , Kazuhiro Sayama ₁

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The production of hypochlorous acid (HClO) over a visible-light active photocatalyst was achieved for the first time in an aqueous solution of NaCl under simulated solar light. Approximately 17.6 μM of HClO was accumulated after 1 h of photoirradiation by employing the photocatalytic oxidation of Cl^– with O₂ reduction over the Pt cocatalyst-loaded WO₃. The quantum efficiency of the HClO production was 2.3% at 420 nm. Moreover, the photoelectrochemical HClO production on the WO₃ photoanode was also investigated to elucidate the photocatalytic reaction mechanism. The initial faradaic efficiency of the process reached 96%, indicating high selectivity toward the production of HClO over the WO₃ surface in an aqueous NaCl solution. It was found that the highly photocatalytic performance over Pt-loaded WO₃ was primarily attributed to the higher oxygen reduction and lower H₂O₂ formation abilities in comparison to other cocatalysts.

中文翻译：

模拟太阳光下Pt / WO ₃上光催化生产次氯酸

在可见光活性光催化剂上，在NaCl水溶液中，在模拟太阳光下首次实现了次氯酸（HClO）的生产。约的HClO 17.6μM通过采用Cl组成的光催化氧化的光照射1个小时后积累^-带O ₂还原在Pt助催化剂加载WO ₃。HClO产生的量子效率在420 nm下为2.3％。此外，还研究了在WO _3光阳极上产生光电化学HClO，以阐明光催化反应机理。该方法的初始法拉第效率达到96％，表明在WO _3上对HClO的生产具有很高的选择性。在氯化钠水溶液中的表面。已经发现，与其他助催化剂相比，在载有Pt的WO ₃上的高光催化性能主要归因于较高的氧还原和较低的H ₂ O ₂形成能力。

更新日期：2020-05-19

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