This paper presents the required structure and function of a ring‐FEL as a radiation source for extreme ultraviolet radiation lithography (EUVL). A 100 m‐long straight section that conducts an extremely low emittance beam from a fourth‐generation storage ring can increase the average power at 13.5 nm wavelength to up to 1 kW without degrading the beam in the rest of the ring. Here, simulation results for a ring‐FEL as a EUVL source are described.

中文翻译：

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演示Ring-FEL作为EUV光刻工具

本文介绍了Ring-FEL作为极紫外辐射光刻（EUVL）的辐射源所需的结构和功能。一条100 m长的直段会传导来自第四代存储环的极低发射光束，可以使13.5 nm波长处的平均功率增加到1 kW，而不会破坏环其余部分的光束。在此，描述了作为EUVL源的ring-FEL的仿真结果。