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Nutrient solutions for Arabidopsis thaliana: a study on nutrient solution composition in hydroponics systems.
Plant Methods ( IF 4.7 ) Pub Date : 2020-05-18 , DOI: 10.1186/s13007-020-00606-4
Sander H van Delden 1 , Mohammad Javad Nazarideljou 1, 2 , Leo F M Marcelis 1
Affiliation  

There is little information on the effect of nutrient solutions composition on Arabidopsis growth. Therefore, we compared growth performance of Arabidopsis thaliana (Col-0) grown on the most commonly used nutrient solutions in deep water culture: Hoagland and Arnon, Murashige and Skoog, Tocquin, Hermans, and Conn. In addition to these nutrient solution composition experiments, we established Arabidopsis growth response curves for nutrient solution concentration and salt stress (NaCl). Arabidopsis rosette fresh and dry weight showed an approximate linear decline with NaCl dose in deep water culture, i.e. 9% reduction relative to control per unit of electrical conductivity (EC in dS m−1, for scale comprehension 1 dS m−1 equals ~ 10 mM NaCl). The Tocquin, ½Hoagland and Conn nutrient solutions had equal and optimal growth performance. Optimal nutrient solution concentration for Tocquin and Hoagland was 0.8 to 0.9 dS m−1. Close to the EC of ½Hoagland (1.1 dS m−1), which is frequently used in Arabidopsis research. Conn solution showed optimal growth at much higher EC (2 dS m−1) indicating that it is a balanced nutrient solution that matches the needs of Arabidopsis. Full Murashige and Skoog solution (5.9 dS m−1) was lethal and diluted solutions (EC of 1.6 and 1.1 dS m−1) caused stress symptoms and severe growth retardation at later developmental stages. Arabidopsis thaliana (Col-0) plants grown in deep water culture showed a sixfold growth difference when commonly used nutrient solutions were compared. Murashige and Skoog solution should not be used as nutrient solution in deep water culture. Conn, Tocquin and ½Hoagland are balanced nutrient solutions which result in optimal Arabidopsis growth in hydroponic systems.

中文翻译:


拟南芥营养液:水培系统营养液成分的研究。



关于营养液成分对拟南芥生长影响的信息很少。因此,我们比较了深水培养中最常用的营养液(Hoagland 和 Arnon、Murashige 和 Skoog、Tocquin、Hermans 和 Conn)上生长的拟南芥 (Col-0) 的生长性能。除了这些营养液成分实验之外,我们建立了拟南芥生长对营养液浓度和盐胁迫(NaCl)的响应曲线。拟南芥莲座丛鲜重和干重在深水培养中随 NaCl 剂量呈近似线性下降,即每单位电导率相对于对照减少 9%(EC 以 dS m−1 为单位,对于尺度理解,1 dS m−1 等于 ~ 10毫米氯化钠)。 Tocquin、½Hoagland 和 Conn 营养液具有相同且最佳的生长性能。 Tocquin 和 Hoagland 的最佳营养液浓度为 0.8 至 0.9 dS m−1。接近拟南芥研究中常用的 ½Hoagland (1.1 dS m−1) 的 EC。 Conn 溶液在更高的 EC (2 dS m−1) 下表现出最佳生长,表明它是一种平衡的营养液,符合拟南芥的需求。完整的 Murashige 和 Skoog 溶液 (5.9 dS m−1) 是致命的,稀释溶液(EC 为 1.6 和 1.1 dS m−1)会在发育后期引起应激症状和严重的生长迟缓。与常用的营养液相比,在深水培养中生长的拟南芥 (Col-0) 植物显示出六倍的生长差异。 Murashige和Skoog溶液不宜用作深水养殖的营养液。 Conn、Tocquin 和 ½Hoagland 是平衡的营养液,可在水培系统中实现拟南芥的最佳生长。
更新日期:2020-05-18
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