Nanoscale structures were produced on silicon surfaces by low‐energy oxygen ion irradiation: periodic rippled or terraced patterns formed spontaneously, depending on the chosen combination of beam incidence angle and ion fluence. Atomic force microscopy image processing and analysis accurately described the obtained nanotopographies. Graphene monolayers grown by chemical vapour deposition were transferred onto the nanostructured silicon surfaces. The interfacial interaction between the textured surface and the deposited graphene governs the conformation of the thin carbon layer; the resulting different degree of regularity and conformality of the substrate‐induced graphene corrugations was studied and it was related to the distinctive topographical features of the silicon nanostructures. Raman spectroscopy revealed specific features of the strain caused by the alternating suspension and contact with the underlying nanostructures and the consequent modulation of the silicon–graphene interaction.

中文翻译：

---

AFM 和拉曼研究沉积在通过离子束照射纳米结构的硅表面上的石墨烯

通过低能氧离子照射在硅表面上产生纳米级结构：根据光束入射角和离子注量的选择组合，自发形成周期性波纹或梯田图案。原子力显微镜图像处理和分析准确地描述了获得的纳米形貌。通过化学气相沉积生长的石墨烯单层被转移到纳米结构的硅表面上。纹理化表面和沉积的石墨烯之间的界面相互作用控制着薄碳层的构象；研究了由此产生的基板诱导石墨烯波纹的不同程度的规则性和共形性，这与硅纳米结构的独特形貌特征有关。