Determination of composition and thickness is crucial for the preparation of thin layers. A separate measurement is possible; however, it could be time-consuming, and each technique requires a specifically prepared sample. Therefore, a combined, fast, and reliable technique would be advantageous. Calibration of energy dispersive X-ray spectroscopy (EDS) integrated with scanning electron microscope (SEM) by X-ray photoelectron spectroscopy (XPS), weighting balance and atomic force microscopy (AFM) were performed for simultaneous and non-destructive concentration, area density and thickness measurements of MnSi and MnGe thin layers prepared by a reactive pulsed laser deposition (PLD). The linearity of calibrations was supported by Monte Carlo calculations. The calibrations enabled the evaluation of Mn concentration with a deviation better than 2.7 at.%. The area density was determined with a deviation better than 6.8 µg/cm 2 , and the thickness was determined with a deviation better than 4.1 nm for samples measured with a standard substrate. The thickness measurement calibration omitting the standard substrate measurement resulted in the higher deviation of 7.6 nm; however, it enabled double sample throughput and spatial analyses.

中文翻译：

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用 EDS 测定 MnSi 和 MnGe 层的成分和厚度

成分和厚度的确定对于薄层的制备至关重要。可以单独测量；然而，这可能很耗时，而且每种技术都需要专门制备的样品。因此，组合的、快速且可靠的技术将是有利的。通过 X 射线光电子能谱 (XPS)、配重平衡和原子力显微镜 (AFM) 对与扫描电子显微镜 (SEM) 集成的能量色散 X 射线光谱 (EDS) 进行校准，用于同时无损浓度、面积密度通过反应脉冲激光沉积 (PLD) 制备的 MnSi 和 MnGe 薄层和厚度测量。Monte Carlo 计算支持校准的线性。校准使评估 Mn 浓度的偏差优于 2。7 原子百分比。对于使用标准基板测量的样品，面密度以优于6.8μg/cm 2 的偏差确定，并且厚度以优于4.1nm的偏差确定。省略标准基板测量的厚度测量校准导致更高的偏差为 7.6 nm；然而，它实现了双倍的样本吞吐量和空间分析。