Submicron sized strip lines of NdFeAs(O,F) were fabricated and the transport properties were studied. By using laser lithography and dry etching, strip lines with a width of down to 0.84 μm were fabricated. The superconducting critical temperature (T c) was not seriously affected by the fabrication process, but a significant decrease of the critical current density (J c) was observed for strip lines narrower than 2 μm when the sample was patterned by isotropic etching. By employing an anisotropic etching process, on the other hand, the deterioration of J c was largely prevented, and the yield of obtaining a strip line with J c higher than 5 MA/cm2 rose considerably.

中文翻译：

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NdFeAs(O,F) 薄膜的微细加工和传输性能评估

制造了亚微米尺寸的 NdFeAs(O,F) 带状线并研究了传输特性。通过使用激光光刻和干法蚀刻，制造了宽度低至 0.84 μm 的带状线。超导临界温度（T c ）不受制造工艺的严重影响，但当样品通过各向同性蚀刻图案化时，对于窄于 2 μm 的带状线，观察到临界电流密度（J c）显着降低。另一方面，通过采用各向异性蚀刻工艺，J c 的劣化得到了很大程度的防止，并且获得 J c 高于 5 MA/cm2 的带状线的良率显着提高。