ABSTRACT Analysis of electrodynamic conditions of new photo-assisted nanoscale polishing method is presented. The proposed method implements subnano-polishing of quartz surface covered with sodium hypochlorite solution when the lighting from the quartz side and the total internal reflection are taken place. It was found that for a quartz surface profile the optimal conditions for photochemical polishing are achieved when the angle of light incidence is critical and the standard deviation of the quartz surface height is small (up to 10 nm). In this case, the evanescent wave, which propagates along the quartz surface, creates a greater amplitude of field energy oscillations in the region of surface protrusions than in the region of troughs. At the same time, the electrodynamic solution is essentially independent of the light wavelength and the field contrast above the quartz surface is decreased, when the length of the correlation of the rough surface profile is increased.

中文翻译：

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次氯酸钠溶液覆盖石英表面光辅助抛光技术：电动力学分析

摘要 介绍了新的光辅助纳米级抛光方法的电动条件分析。当发生来自石英侧的照明和全内反射时，所提出的方法对覆盖有次氯酸钠溶液的石英表面进行亚纳米抛光。发现对于石英表面轮廓，当光入射角至关重要且石英表面高度的标准偏差很小（高达 10 nm）时，可实现光化学抛光的最佳条件。在这种情况下，沿石英表面传播的倏逝波在表面突起区域比在波谷区域产生更大振幅的场能振荡。同时，