This study reports the comparative removal of an emerging contaminant diclofenac sodium (DCF) by UV-254 nm based advanced oxidation processes (AOPs), i.e., UV/S₂O₈^2–/Fe²⁺, UV/HSO₅^–/Fe²⁺ and UV/H₂O₂/Fe²⁺ processes. The results demonstrated that by applying [DCF]₀ = 0.30 mM and [H₂O₂]₀ = [S₂O₈^2–]₀ = [HSO₅^–]₀ = 3mM, k_app values were 0.082, 0.166, 0.221, 0.485 and 2.014 min^–1 for UV-only, UV/Fe²⁺, UV/H₂O₂/Fe²⁺, UV/S₂O₈^2–/Fe²⁺ and UV/HSO₅^–/Fe²⁺ processes, respectively. At different [DCF]₀ from 0.30 to 0.90 mM, the degradation rate was increased from 0.01 mM min^–1 to 0.12 mM min^–1, while the corresponding k_app values were decreased from 2.01 min^–1 to 1.04 min^–1. The removal performance of the applied AOP was significantly influenced by the presence of natural water contaminants (NO₃^–, Cl^–, HCO₃^–, SO₄^2– and humic aicd (HA)) and [pH]₀. The inhibition of these natural water contaminants on the removal of DCF by UV/HSO5–/Fe2+ process was in the order of HA > NO₂^– > SO₄^2– > HCO₃^– ≈ Cl^– > NO₃^–. Furthermore, seven (07) degradation products (DPs) of DCF were explored by UPLC-MS/MS and accordingly degradation pathways of DCF were suggested. The practical applications of the proposed AOPs towards removal of DCF were further strengthen by calculating total organic carbon removal and toxicity assessment.

这项研究报告了通过基于UV-254 nm的高级氧化工艺（AOP），即UV / S ₂ O ₈ ^2– / Fe 2 ⁺，UV / HSO ₅ ^– / Fe的新兴污染物双氯芬酸钠（DCF）的比较去除。²⁺和UV / H ₂ O ₂ / Fe ²⁺工艺。结果表明，通过应用[DCF] ₀ = 0.30 mM和[H ₂ O ₂ ] ₀ = [S ₂ O ₈ ^2– ] ₀ = [HSO ₅ ^– ] ₀ = 3mM，k _app对于纯紫外线，UV / Fe 2 ⁺，UV / H ₂ O ₂ / Fe ₂ ⁺，UV / S ₂ O ₈ ^2- / Fe ²⁺和UV值分别为0.082、0.166、0.221、0.485和2.014 min ^–1 / HSO ₅ ^– / Fe ²⁺工艺。在[DCF] ₀从0.30到0.90 mM的情况下，降解速率从0.01 mM min ^–1增加到0.12 mM min ^–1，而相应的k _app值从2.01 min ^–1减少到1.04 min ^–1。施加的除去性能AOP用天然水污染物的存在显著影响（NO ₃ ^- ，氯^-，HCO ₃ ^-，SO ₄ ^2-和腐殖酸AICD（HA））和[pH值] ₀。这些天然水污染物对通过UV / HSO5- / Fe2 +的过程去除DCF的抑制是在HA> NO的顺序₂ ^- > SO ₄ ^2- > HCO ₃ ^- ≈氯^- > NO ₃ ^-。此外，通过UPLC-MS / MS探索了DCF的七（07）个降解产物（DPs），并据此提出了DCF的降解途径。通过计算总有机碳去除量和毒性评估，进一步加强了拟议的AOP在去除DCF方面的实际应用。