Versatile multilayer designs based on a transparent conductive oxide (TCO)/metal/TCO structure are proposed to overcome the trade-off between their electrical and optical properties. The overall performance of the investigated multilayer designs based on ZnO/metal/ZnO and indium tin oxide (ITO)/metal/ITO structures is compared based on their Haacke figure of merit (FoM) at λ = 550 nm. The influence of both the thickness and position of the inserted silver and gold ultrathin metallic layer (ML) on the electrode FoM is studied. To address the trade-off between transparency and conductivity, a new hybrid approach combining the proposed multilayer designs and particle swarm optimization is conducted. The optimized multilayer design with the ITO/Ag/ITO structure is found to open a new avenue towards the achievement of ultrahigh FoM values of 135 × 10⁻³ Ω⁻¹, superior to those found to date, with a high transmittance above 95% and a reduced sheet resistance of 4.7 Ω × sq⁻¹. This enhancement can be attributed to the dual effects of the enhanced light management induced by effectively modulating the ML geometry and the reduced sheet resistance. The proposed design methodology therefore bridges the gap between high transparency and low sheet resistance, becoming suitable for use in high-performance optoelectronic applications.

中文翻译：

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TCO /金属/ TCO多层透明电极的性能评估：从设计概念到优化

提出了一种基于透明导电氧化物（TCO）/金属/ TCO结构的多功能多层设计，以克服其电学和光学特性之间的折衷。根据研究的基于ZnO /金属/ ZnO和铟锡氧化物（ITO）/金属/ ITO结构的多层设计的整体性能，根据其在λ处的Haacke品质因数（FoM）进行比较 = 550 nm。研究了插入的银和金超薄金属层（ML）的厚度和位置对电极FoM的影响。为了解决透明性和电导率之间的折衷问题，进行了将提出的多层设计与粒子群优化相结合的新混合方法。优化的多层设计与ITO /银/ ITO结构被发现打开了新的途径向的超高的FoM值的实现135×10 ^-3  Ω ^-1，优于至今发现，具有高透射率在95％以上并降低了4.7Ω×sq ^-1的薄层电阻。这种增强可以归因于通过有效地调制ML几何形状和减小的薄层电阻而引起的增强的光管理的双重效果。因此，所提出的设计方法弥合了高透明性和低薄层电阻之间的差距，从而变得适用于高性能光电应用。