The micromorphology and semiconductor properties of TiO₂ thin films growth using different ion beam energies have been finely analyzed using atomic force microscopy (AFM), ultra-violet visible (UV–visible) spectroscopy and stereometric analysis. The AFM measurements and surface stereometric analysis are essential for the accurate characterization of the 3-D surface topographic features and allow the determination of the 3-D surface texture parameters that influence the optical properties of the material. The samples were divided into four groups to discuss the obtained results, according to the ion beam energy applied in the sample preparation. The results obtained from experimental measurements suggested that the surface of samples prepared at lower beam energy had the most regular surface (Sq = 6.25 nm), while the most irregular surface was found in samples prepared with the highest ion beam energy (Sq = 13.40 nm). The transmittance (%) and reflectance (%) spectra, and the band gap energy experienced noticeable changes with increasing applied energy and deposition pressures due to the increase of the surface tension and decrease of the grain sizes. Our investigation shows that the deposition pressure and applied energy affect the optical and the roughness of titania thin films, which partially contribute to the functionality of the surface that, in turn, makes titania useful for the fabrication of different optoelectronic devices.

中文翻译：

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电子束离子辅助沉积TiO 2薄膜的立体分析

TiO ₂的微观形貌和半导体性能使用原子力显微镜（AFM），紫外可见光（UV-visible）光谱法和立体分析法对使用不同离子束能量的薄膜生长进行了精细分析。AFM测量和表面立体分析对于准确表征3-D表面形貌特征至关重要，并且可以确定影响材料光学特性的3-D表面纹理参数。根据样品制备中使用的离子束能量，将样品分为四组以讨论获得的结果。从实验测量获得的结果表明，以较低束能量制备的样品表面具有最规则的表面（Sq = 6.25 nm），而在具有最高离子束能量（Sq = 13.40 nm）的样品中发现了最不规则的表面。由于表面张力的增加和晶粒尺寸的减小，随着施加的能量和沉积压力的增加，透射率（％）和反射率（％）光谱以及带隙能量发生了显着变化。我们的研究表明，沉积压力和施加的能量会影响二氧化钛薄膜的光学性能和粗糙度，这部分有助于表面的功能，进而使二氧化钛可用于制造不同的光电器件。由于表面张力的增加和晶粒尺寸的减小，带隙能量随着施加的能量和沉积压力的增加而发生显着变化。我们的研究表明，沉积压力和施加的能量会影响二氧化钛薄膜的光学性能和粗糙度，这部分有助于表面的功能，进而使二氧化钛可用于制造不同的光电器件。由于表面张力的增加和晶粒尺寸的减小，带隙能量随着施加的能量和沉积压力的增加而发生明显变化。我们的研究表明，沉积压力和施加的能量会影响二氧化钛薄膜的光学性能和粗糙度，这部分有助于表面的功能，进而使二氧化钛可用于制造不同的光电器件。