ABSTRACT The efficiency of the integrated UV/O3/persulfate (PS) process was preliminarily explored with the emphasis on the pollutant removal performance and reactive radical contributions in this study. The results demonstrated that the integrated UV/O3/PS process was significantly efficient with the pseudo-first-order rate constants of atrazine (ATZ) degradation increased by 18.7, 3.3 and 2.6 times compared to that in the O3/PS, UV/O3 and UV/PS processes, respectively. Hydroxyl radical (•OH) and sulfate radical (SO4 •−) were corroborated to be the dominant reactive radicals in the UV/O3/PS process via the radical scavenger experiments. The increase of PS dosage in the UV/O3/PS process could contribute to the accelerated abatement of ATZ due to the enhanced formation of •OH and SO4 •−. The UV/O3/PS process was demonstrated to be not susceptible to the impact of solution pH and could achieve a high removal efficiency of ATZ at each experimental pH condition (3.5 − 9.5). Compared to UV photolysis, O3 and •OH, SO4 •− was confirmed to play a more important role and account for 57.3%−72.1% elimination of ATZ at the investigated pHs. Moreover, the O3/UV/PS treatment had a moderate resistance to the influence of water matrix components such as bicarbonate ions, providing a potential alternative for effective decontamination of organic contaminants in water treatment.

中文翻译：

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紫外线/臭氧/过硫酸盐综合工艺有效去除莠去津的初步研究

摘要 本研究初步探讨了 UV/O3/过硫酸盐 (PS) 集成工艺的效率，重点是污染物去除性能和反应性自由基的贡献。结果表明，与 O3/PS、UV/O3 相比，集成的 UV/O3/PS 过程显着有效，莠去津 (ATZ) 降解的准一级速率常数分别增加了 18.7、3.3 和 2.6 倍。和 UV/PS 工艺，分别。通过自由基清除剂实验，羟基自由基 (•OH) 和硫酸盐自由基 (SO4•-) 被证实是 UV/O3/PS 过程中的主要反应性自由基。由于 •OH 和 SO4 •- 的形成增加，UV/O3/PS 过程中 PS 剂量的增加可能有助于加速减量 ATZ。UV/O3/PS 工艺被证明不受溶液 pH 值的影响，并且可以在每个实验 pH 条件 (3.5 - 9.5) 下实现对 ATZ 的高去除效率。与 UV 光解、O3 和 •OH 相比，SO4 •- 被证实起着更重要的作用，并且在所研究的 pH 值下消除了 57.3%-72.1% 的 ATZ。此外，O3/UV/PS 处理对水基质成分（如碳酸氢根离子）的影响具有中等抵抗力，为有效净化水处理中的有机污染物提供了潜在的替代方案。在研究的 pH 值下，1% 的 ATZ 消除 此外，O3/UV/PS 处理对水基质成分（如碳酸氢根离子）的影响具有中等抵抗力，为有效净化水处理中的有机污染物提供了潜在的替代方案。在研究的 pH 值下，1% 的 ATZ 消除。此外，O3/UV/PS 处理对水基质成分（如碳酸氢根离子）的影响具有中等抵抗力，为有效净化水处理中的有机污染物提供了潜在的替代方案。