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Cleaning Solutions for Removal of ∼30 nm Ceria Particles from Proline and Citric Acid Containing Slurries Deposited on Silicon Dioxide and Silicon Nitride Surfaces
ECS Journal of Solid State Science and Technology ( IF 2.2 ) Pub Date : 2020-05-11 , DOI: 10.1149/2162-8777/ab8ffa
Akshay Gowda , Jihoon Seo , Charith K. Ranaweera , S. V. Babu

A previously developed aqueous cleaning solution (4.2 mol l −1 each of H 2 O 2 and NH 4 OH) was found to be ineffective in cleaning oxide/nitride surfaces after contamination with ceria particles from slurries containing proline or citric acid. However, a cleaning solution consisting of 1 wt% ascorbic acid, 1 wt% ammonium carbonate and 50 ppm triton X-100 at pH 12, aided by ultrasonic cleaning, removed these ceria particles, even those as small as ∼30 nm, from both oxide and nitride surfaces with efficiencies >99% as determined by AFM imaging. Fourier transform infrared (FTIR) spectroscopy results indicated that ceria particles treated with these additives can also bind with oxide/nitride surfaces through Si–O–C and Si–O–H bonds, in addition to any Ce–O–Si, where the C and H atoms are from the additives adsorbed on the ceria particles. All these bonds are broken effectively by the nucleophilic attack of hydroxyl anions in the cleaning sol...

中文翻译:

从沉积在二氧化硅和氮化硅表面的脯氨酸和柠檬酸浆液中去除〜30 nm二氧化铈颗粒的清洁溶液

在用来自脯氨酸或柠檬酸的浆料中的二氧化铈颗粒污染后,发现先前开发的水性清洁溶液(H 2 O 2和NH 4 OH各自为4.2 mol l -1)在清洁氧化物/氮化物表面上无效。但是,由1 wt%的抗坏血酸,1 wt%的碳酸铵和50 ppm的pH值为12的triton X-100组成的清洗溶液,在超声清洗的帮助下,从两者中去除了这些二氧化铈颗粒,甚至小至30 nm。通过AFM成像确定,氧化物和氮化物表面的效率> 99%。傅里叶变换红外(FTIR)光谱结果表明,除任何Ce-O-Si之外,用这些添加剂处理的二氧化铈颗粒还可以通过Si-O-C和Si-O-H键与氧化物/氮化物表面结合。 C和H原子来自吸附在二氧化铈颗粒上的添加剂。
更新日期:2020-05-11
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