ABSTRACT In this work, the thin films of vanadium oxide on Si substrate were deposited by RF sputtering and pulsed laser deposition method. The as-deposited samples were annealed in argon atmosphere at 500°C for 1 h and cooled at natural rate in argon atmosphere. The as-deposited and annealed samples were irradiated with 100 MeV Ag ions at different fluences. Structural characterizations were done by grazing incidence X-ray diffraction (GIXRD) and Raman spectroscopy at room temperature. GIXRD and Raman spectra revealed that phase transformation took place after swift heavy ions irradiation and the ratio of oxygen/vanadium concentration of the films decreased. The phase transformation and change in concentration may be due to transiently molten cylindrical zone created by the passage of swift heavy ions in the material.

中文翻译：

---

快速重离子辐照氧化钒薄膜的相变

摘要 在这项工作中，通过射频溅射和脉冲激光沉积方法在硅衬底上沉积氧化钒薄膜。沉积后的样品在氩气气氛中在 500°C 下退火 1 小时，然后在氩气气氛中以自然速率冷却。沉积态和退火态样品用 100 MeV Ag 离子以不同的能量密度进行辐照。在室温下通过掠入射 X 射线衍射 (GIXRD) 和拉曼光谱进行结构表征。GIXRD和拉曼光谱表明，在快速重离子照射后发生相变，薄膜的氧/钒浓度比降低。相变和浓度变化可能是由于材料中快速重离子通过而产生的瞬时熔融圆柱形区域。