For the aspheric optical surface finished with a doughnut-shaped MCF (magnetic compound fluid) polishing tool, the performance of the polishing tool depends mainly on the properties of the MCF slurry. Therefore, understanding the effect of each MCF slurry component on the polishing characteristics is crucial to developing novel polishing techniques. In this paper, the polishing principle was depicted and the corresponding polishing jig was constructed with a six-degree-of-freedom manipulator. The conical surfaces, which were considered as special aspheric surfaces, were experimentally polished under proper polishing conditions to examine the effects of the carbonyl iron particles (CIPs) concentration and the sizes of the abrasive particles (APs) on the polishing ability to remove material/tool marks and improve work surface qualities. Theoretical analyses were also performed to gain a more comprehensive understanding of the behaviors of CIPs and APs in the magnetic field. The results were shown as follows: (1) The CIPs concentration affected positively the magnetization of the MCF slurry, leading to better performance in the removal rate of material/tool marks when a higher CIPs concentration of was applied. The best surface quality was attained with a CIPs concentration of 45 wt%. (2) Larger APs were beneficial for obtaining higher removal rates of material/tool marks. The APs with 1 μm in diameter were preferred for achieving a better surface quality. (3) Ferric clusters were formed along the magnetic line of force and their orientations changed periodically to stir the APs with the magnet revolution. (4) The Aps, at a given working gap, can squeeze the work-surface. The squeezing action was much more intense when larger APs and the MCF slurry with a higher magnetization were employed. (5) The material removal model suggested that the material was removed due to the APs and the relative motion between the work-surface and APs.

对于用甜甜圈形MCF（磁性化合物流体）抛光工具精加工的非球面光学表面，抛光工具的性能主要取决于MCF浆料的性能。因此，了解每种MCF浆料成分对抛光特性的影响对于开发新型抛光技术至关重要。本文描述了抛光原理，并使用六自由度机械手构造了相应的抛光夹具。在适当的抛光条件下，对被视为特殊非球面的圆锥形表面进行了实验抛光，以检查羰基铁颗粒（CIPs）浓度和磨料颗粒（APs）尺寸对去除材料/工具标记并提高工作表面质量。还进行了理论分析，以更全面地了解CIP和AP在磁场中的行为。结果表明：（1）CIPs浓度对MCF浆液的磁化强度有积极影响，当使用较高的CIPs浓度时，可提高材料/工具痕迹的去除率。CIPs浓度为45 wt％时，可获得最佳的表面质量。（2）较大的AP有助于获得更高的材料/工具标记去除率。为了获得更好的表面质量，优选使用直径为1μm的AP。（3）沿着磁力线形成了铁团簇，它们的方向周期性地改变，从而随着磁铁的旋转搅动AP。（4）Aps在给定的工作间隙下会挤压工作表面。当使用较大的AP和具有较高磁化强度的MCF浆料时，挤压作用更加强烈。（5）物料去除模型表明物料是由于AP和工作面与AP之间的相对运动而被去除的。