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Atomic Layer Deposition for Polypropylene Film Engineering—A Review
Macromolecular Materials and Engineering ( IF 4.2 ) Pub Date : 2020-05-08 , DOI: 10.1002/mame.202000127
Guanghui Song 1 , Daniel Q. Tan 1
Affiliation  

Polypropylene (PP) polymers are used extensively as dielectric layers, packaging films, and separation membranes, etc. Structure, chemistry, and surface features of PP films dominate their performance and durability. Modification of PP films is carried out using atomic layer deposition (ALD) among other techniques to coat uniform layer of nanometer inorganic material on the surface and inside the pores of PP films to serve the purpose of target applications better. Controlling the reaction temperature, precursor pulsing time, and number of cycles during deposition predominate the thickness, morphology, and composition of the coated layer and hence the performance of PP films. Overall, the ALD technique has been proven to be advantageous in advancing PP film properties such as hydrophilicity, UV resistance, membrane separators, dielectric and mechanical strength, etc., primarily through the controllable formation of nanometer coating on PP films. This review discusses the recent advancements and prospective of ALD in the modification and functionalization of PP films for various applications to provide some insights and motivations to design high‐performance novel PP films by well leveraging the ALD technique.

中文翻译:

聚丙烯薄膜工程的原子层沉积研究进展

聚丙烯(PP)聚合物被广泛用作介电层,包装膜和隔离膜等。PP膜的结构,化学性质和表面特征决定了它们的性能和耐用性。PP膜的改性是使用原子层沉积(ALD)等技术进行的,以在PP膜的表面和孔内涂覆均匀的纳米无机材料层,以更好地满足目标应用的目的。控制反应温度,前驱物脉冲时间和沉积过程中的循环数主要控制涂层的厚度,形态和组成,进而决定PP膜的性能。总体而言,ALD技术已被证明在提高PP膜的性能(例如亲水性,抗紫外线性,膜分离器,介电强度和机械强度等,主要是通过在PP薄膜上可控地形成纳米涂层来实现的。这篇综述讨论了ALD在各种用途的PP膜的改性和功能化方面的最新进展和前景,从而为通过充分利用ALD技术设计高性能新型PP膜提供了一些见识和动机。
更新日期:2020-05-08
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