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Inverted plasmonic lens design for nanometrology applications
Measurement Science and Technology ( IF 2.7 ) Pub Date : 2020-05-04 , DOI: 10.1088/1361-6501/ab7e6b
T Kseberg 1 , T Siefke 1, 2 , S Kroker 1, 3 , B Bodermann 1
Affiliation  

Planar plasmonic lenses have attracted a great deal of interest over the last few years for their super-resolution focusing capabilites. These highly compact structures with dimensions of only a few micrometres allow for the focusing of light to sub-wavelength-sized spots with focal lengths reaching into the far-field. This offers opportunities for new methods in nanometrology; for example, applications in microscopic Mueller matrix ellipsometry setups. However, the conventional plasmonic lens is challenging to fabricate. We present a new design for plasmonic lenses, which is called the inverted plasmonic lens, to accommodate the lithographic fabrication process. In this contribution, we used numerical simulations based on the finite element method in combination with particle swarm optimization to determine ideal parameter ranges and tolerances for the design of inverted plasmonic lenses for different wavelengths in the visible and near-infrared domain and focal lengths between...

中文翻译:

纳米等离子应用的等离子倒置透镜设计

近年来,平面等离子透镜以其超分辨率聚焦功能而引起了人们的极大兴趣。这些高度紧凑的结构只有几微米的尺寸,可以将光聚焦到亚波长尺寸的光点,焦距达到远场。这为纳米计量学的新方法提供了机会。例如,在微观Mueller矩阵椭圆仪设置中的应用。然而,传统的等离子透镜难以制造。我们提出了一种新的等离子透镜设计,称为倒置等离子透镜,以适应光刻制造工艺。在这项贡献中,
更新日期:2020-05-04
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