Ternary CdS/MoS₂/ZnO (CMZ) photocatalyst was prepared that successfully degraded ofloxacin antibiotic under visible light irradiation. SEM mapping analyses of CMZ showed homogenous elemental distribution. The XRD analysis shows that ternary composites contained ZnO in the hexagonal wurtzite, CdS in cubic phase and MoS₂ in the hexagonal structure. UV-DRS results of CMZ exhibited thresholds of ~ 430 nm. The photocatalytic degradation studies were performed with ofloxacin antibiotic (290 nm) under visible light irradiation. BET results presented Type III isotherm and H3 hysteresis. Ternary CMZ showed higher photoelectrochemical and photocatalyic activity due to prolonged lifetime of charge it carries, crystalline defect and surface plasmon resonance of CdS. The kinetic rate constant of ternary CMZ was 4 times higher than that of CdS/MoS₂ (CM). This study presents an effective photocatalysis and the mechanism of ofloxacin degradation by CMZ ternary composite heterojunction.

制备了能在可见光照射下成功降解氧氟沙星抗生素的三元CdS / MoS ₂ / ZnO（CMZ）光催化剂。CMZ的SEM映射分析显示元素分布均匀。XRD分析表明，三元复合材料在六方纤锌矿中含有ZnO，立方相中的CdS和MoS _2。在六角形结构中。CMZ的UV-DRS结果显示约430 nm的阈值。用氧氟沙星抗生素（290 nm）在可见光照射下进行光催化降解研究。BET结果显示了III型等温线和H3磁滞现象。三元CMZ由于其携带的电荷寿命延长，CdS的晶体缺陷和表面等离振子共振而显示出更高的光电化学和光催化活性。三元CMZ的动力学速率常数比CdS / MoS ₂（CM）高4倍。这项研究提出了一种有效的光催化作用，以及CMZ三元复合异质结降解氧氟沙星的机理。