Inside Cover Picture: Plasma Process. Polym. 5/2020,Plasma Processes and Polymers

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Inside Cover Picture: Plasma Process. Polym. 5/2020
Plasma Processes and Polymers ( IF 2.9 ) Pub Date : 2020-05-04 , DOI: 10.1002/ppap.202070012
Malini Dasgupta ₁ , Paolo Fortugno ₁ , Hartmut Wiggers _{1,

2}

Affiliation

Inside Front Cover: Silicon nanoparticles produced in a microwave‐assisted plasma reactor are subjected to in‐line functionalization in the plasma after‐glow. Various coating precursors including TEOS, HMDSO and OMCTS were tested for their suitability. TEOS emerged to be the optimum choice in terms of formation of thin layers of pure SiO2 around the silicon core. The photograph shows the plasma zone with the beam of luminescing silicon nanoparticles. The image is taken by Jan Menser.

中文翻译：

内页图片：等离子工艺。Polym。5/2020

封面内层：在微波辅助等离子体反应器中产生的硅纳米颗粒在余辉等离子体中进行在线功能化。测试了包括TEOS，HMDSO和OMCTS在内的各种涂层前体的适用性。就在硅芯周围形成纯SiO2薄层而言，TEOS成为了最佳选择。该照片显示了带有发光硅纳米粒子束的等离子体区域。图片由Jan Menser拍摄。

更新日期：2020-05-04

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