Front Cover: Liquid‐Phase Quasi‐Epitaxial Growth of Highly Stable, Monolithic UiO‐66‐NH2 MOF thin Films on Solid Substrates (ChemistryOpen 5/2020),ChemistryOpen

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Front Cover: Liquid‐Phase Quasi‐Epitaxial Growth of Highly Stable, Monolithic UiO‐66‐NH2 MOF thin Films on Solid Substrates (ChemistryOpen 5/2020)
ChemistryOpen ( IF 2.5 ) Pub Date : 2020-05-04 , DOI: 10.1002/open.202000086
Tawheed Hashem ₁ , Elvia P. Valadez Sánchez _{1,

2} , Peter G. Weidler ₁ , Hartmut Gliemann ₁ , Mohamed H. Alkordi ₃ , Christof Wöll ₁

Affiliation

The front cover shows a successful synthesis of high quality, monolithic UiO‐66‐NH2 MOF thin films on diverse solid substrates via a low‐temperature liquid phase epitaxy method. The achievement of continuous MOF‐coatings with low defect densities and pronounced stability against high temperatures and hot water was proven. The new type of coatings clearly outperforms other reported types of MOF thin films. More information can be found in the Communication by Tawheed Hashem et al.

中文翻译：

封面：固态衬底上高度稳定的整体式UiO-66-NH2 MOF薄膜的液相准外延生长（ChemistryOpen 5/2020）

前盖显示了通过低温液相外延方法在各种固体衬底上成功合成了高质量的单片UiO-66-NH2 MOF薄膜。事实证明，MOF连续涂层具有低缺陷密度和明显的高温和热水稳定性。新型涂层明显优于其他报告类型的MOF薄膜。可以在Tawheed Hashem等人的《通讯》中找到更多信息。

更新日期：2020-05-04

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