A novel application-oriented sub-pixel measurement method utilizing an active contour model with image resampling is presented for a critical dimension (CD) measurement of pixel patterns of a flat-panel thin film transistor crystal display (TFT-LCD) and organic light-emitting diode display. In modern manufacturing of flat panel display, optical measurement of each dimension of pixel patterns has a critical role in the process control, and the resolution of a measurement system becomes a limitation of the manufacturing process. Several methods have been developed to overcome this limit at the image post processing stage, but as the level of pixel integration and manufacturing throughput are increasing rapidly, more robust and effective inspection approach is required. In this paper, a novel sub-pixel level edge detection algorithm with active contour method and fast pixel resampling is proposed for micron scale CD measurement, and its advantages on measurement repeatability and noise handling are presented, along with the results of various industrial sample measurements and comparison with conventional critical dimension measurement algorithms.

针对平板薄膜晶体管晶体显示器（TFT-LCD）和有机光的像素图案的临界尺寸（CD）测量，提出了一种利用主动轮廓模型和图像重采样的新颖的面向应用的子像素测量方法。发光二极管显示器。在平板显示器的现代制造中，像素图案的各个尺寸的光学测量在过程控制中具有关键作用，并且测量系统的分辨率成为制造过程的限制。已经开发了几种方法来克服在图像后处理阶段的该限制，但是随着像素集成水平和制造吞吐量的迅速提高，需要更加鲁棒和有效的检查方法。在本文中，